Magnetron Sputter Coater

COMPACT DC MAGNETRON SPUTTERING COATER is designed to make some metal films,the film area can be up to 4 inches.It has a 2 inch size and the height between the sample stage and the sputter head can be adjusted between 30 and 80 mm. A manually operable sputter baffle is installed for pre-sputtering. The sputtering time of the sputtering head can be adjusted between 1 and 120 s. If you want a thin film, the sputtering time can be set shorter; if you want a thick film, the sputtering time can be longer.The device is small in size and cost-effective. It is an ideal coating equipment for making various metal films. It can be equipped with various metal targets and vacuum pump.

HIGH POWER NST MAGNETRON SPUTTERING COATER uses PLC control panel to control the equipment, which is convenient and intuitive to operate.It has a 2-inch water cooling target head and a rotatable sample stage,The water cooling target makes the surface of the sample after coating not deformed due to excessive coating temperature, and even damages the sample; the sample stage can be rotated, and the sample can be rotated while coating to make the surface of the sample uniform after coating. The device is small in size and cost-effective. It is an ideal coating equipment for making various metal films. It can be equipped with various metal targets and vacuum pump.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Single-target magnetron sputtering coater application:

The device can be used to prepare single-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the single-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for research on solid electrolyte and OLED in the laboratory.

The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas path of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Single target magnetron sputtering coater application:

This device can be used for preparing single-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the single target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

NST-3″ TWO ZONES CSS FURNACE is heated by two group of halogen heaters (Top and Bottom) separately with max. 20ºC/s heating rate. Two 30 segment precision temperature controllers are built in with +/-1ºC accuracy. RS485 port and control software are included to allow for the operation of furnace and temperature profile logging via PC. It is excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.

NST 3 ROTARY TARGET PLASMA SPUTTERING COATER is a compact plasma thin film sputter (DC common type). The control panel adopts the touch screen mode. The substrate has a limit of 2″, the sample is placed with a diameter of Ø50mm and the heating temperature is 500℃.3 rotary target plasma sputtering coater can sputter gold, silver and copper targets, and can not sputter light metals and carbon. This machine uses a rotating sample stage to sequentially coat three layers on the same sample.The film is suitable for the preparation of samples in the laboratory.

NST -300-1HD SINGLE TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and so on. The instrument is equipped with a magnetron sputtering target with a water-cooled interlayer and a 140mm heatable rotary object stage. The vacuum chamber adopts the top opening method, which makes it easier to change the target, and it is an ideal device for making various metal films. It is an ideal equipment for the preparation of films of various materials in the laboratory.

300-2HD DUAL TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and ceramic. Film, dielectric film, optical film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.

CUSTOMIZED 5 HEADS NST PLASMA MAGNETRON SPUTTERING COATER is particularly suitable for exploring solid electrolyte materials, combined by 5 different elements in 16 different ratios.This equipment is mainly used to make an oxide film on a single crystal substrate, so there is no need for a high vacuum environment.

NST-5-INCH CLOSE-RANGE ROTARY EVAPORATION COATING FURNACE is a rapid thermal processing furnace with 11″ I.D. quartz chamber. It is designed for Thermal Evaporating or CSS (Close Spaced Sublimation) film coating up to 5″ Dia. circular samples and 800°C Max. The furnace is heated by two group of halogen heaters (Top and Bottom) separately with max. 10℃/s heating rate. Two 30 segment precision temperature controllers are built in with +/-1ºC accuracy. RS485 port and control software are included to allow for the operation of furnace and temperature profile logging via PC. It is an excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.

600-3HD THREE-TARGET MAGNETRON SPUTTERING COATER is a newly developed coating equipment, which can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical Film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.

COMBINATORIAL PLASMA SPUTTERING COATER is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.

COMPACT POWDER NST COATING SYSTEM is a small powder coating system consisting mainly of a 2-inch magnetron sputtering head and a vibrating sample stage. The powder is vibrated on the vibrating sample stage, and is coated on the surface of the powder by sputtering to form a core-shell structure. NST magnetron sputtering is suitable for metallic materials on powder surfaces. NST magnetron sputtering is suitable for coating non-metallic materials or carbon on the surface of materials.

DUAL CHAMBER PULSE LASER COATER is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.

NST-DUAL-HEAD HIGH VACUUM MAGNETRON PLASMA SPUTTERING COATER is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc.Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.

NST DUAL-TARGET MAGNETRON SPUTTERING COATER is equipped with a 500W DC power supply and a 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Dual-target magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

DUAL TARGET RF MAGNETRON SPUTTERING COATER is equipped with 300W power supply and 500W DC power supply. The DC power supply can be used for the preparation of metal film, and the power supply can be used for the preparation of non-metal films. The two targets can meet the needs of multi-layer coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.

The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.

In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process. If customers need to install multiple film thickness gauges, also can contact our technical staff for customization.

This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Dual-target magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

ELECTRON BEAM EVAPORATION COATING SYSTEM is used for preparing conductive film, semiconductor film, ferroelectric film, optical film, etc. It is widely used in colleges and universities, scientific research institutions and small batch production.

FOUR SOURCES THERMAL EVAPORATION SYSTEM is suitable for coating most of metallic and organic materials film up to 2″ size from 200 ºC to 1500 ºC (or 200 ºC – 1700 ºC with an optional B-type thermocouple).The sample stage can be rotated to obtain a more uniform film.The evaporating system is small in size, which can effectively save laboratory space; it is easy to operate and has strong adaptability to different materials, so it is widely used in the laboratories of universities and research institutes.

• 280 mm O.D.×260 mm I.D.×310 mm Height quartz chamber for easy cleaning and sample loading
• 2″ Dia rotatable evaporating sources for the uniform film coating
• Tungsten coil heater and alumina crucible for high-temperature coating up to 1700 ºC
• Precision temperature control with 30 programmable segments and +/- 1 ºC accuracy
• High vacuum can be achieved up to 1.0E-5 Torr via optional turbopump
• Gas flow port and valve are built in for chamber purge and CVD possibility

HIGH VACUUM MAGNETRON SPUTTERING COATER is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research of thin film materials and the production of small batch. It can be widely used in universities and colleges, scientific research institutes of thin film materials preparation research and small batch.

THE MAGNETRON TARGET HEAD OF THE MAGNETRON SPUTTERING COATER has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. The device is equipped with 150W NST power supply, which can be used for metal sputter coating. The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs. The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.

Small desktop single-target magnetron sputtering coater application:

The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Three targets magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.