Dadri, Gautam Buddha Nagar, Uttar Pradesh
- GST NO. : 09ARCPD4541L1ZS
Twitter1 Piece (MOQ)
| Business Type | Manufacturer, Exporter, Supplier |
| Color | Blue |
| Condition | New |
| Certification | CE Certified |
| Click to view more | |
Preferred Buyer From
| Location | Anywhere in India |
Product Details
Feature
Ruggedly Constructed,Easy To Use,Less Maintenance
Voltage
220V
Packaging Type
Wooden Boxes
Country of Origin
India
Main Vacuum System
Sphere Structure, Size:Ø 450mm
Loading Sample System
Vertical cylindrical Structure, Size: Ø 150×150mm
Payment Terms
L/C, T/T, Western Union
DUAL CHAMBER PULSE LASER COATER is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.
Technical Specifications
| Main vacuum system | Sphere structure, size:Ø 450mm | |
| Loading sample system | Vertical cylindrical stucture, size: Ø 150×150mm | |
| Vacuum system configuration | Main vacuum chamber | Mechanical pump, molecular pump, valve |
| Loading sample system | Mechanical pump and molecular pump(sharing with primary chamber), valve | |
| Ultimate pressure | Main vacuum system | ≤6*10-6Pa(after baking and degassing) |
| Loading sample system | ≤6*10-3 Pa(after baking and degassing) | |
| Vacuum recovery system | Main vacuum system | It can reach 5×10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
| Loading sample system | It can reach 5×10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) | |
| Rotating target platform | The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm | |
| Substrate heating platform | Sample size | Ø51 |
| Mode of motion | Substrate rotates continuously, rotation speed:5-60 rpm | |
| Heating temperature | Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable | |
| Gas circuit system | 1-circuit mass flow controller, 1-circuit inflation valve | |
| Optional accessories | Laser device | Compatible with coherent 201 laser |
| Laser beam scanning device | 2D scanning mechanical platform, perform two degree of freedom scanning. | |
| Computer control system | The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc. | |
| Space occupied | Main unit | 1800 * 1800mm2 |
| Electric cabinet | 700 *700mm2(one） | |
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