Dadri, Gautam Buddha Nagar, Uttar Pradesh
- GST NO. : 09ARCPD4541L1ZS
Twitter| Business Type | Manufacturer, Exporter, Supplier |
| Brand Name | NST |
| Material | Mild Steel |
| Finishing | Polished |
| Click to view more | |
Preferred Buyer From
| Location | Anywhere in India |
Product Details
Driven Type
Electric
Color
Blue
Condition
New
Certification
ISO 9001:2015
Voltage
220V
Packaging Type
Wooden Box
Specialities
Rust Proof, Long Life, High Performance, Easy To Operate
Phase
Single Phase
Warranty
1 Year
Country of Origin
India
Size
540 mm L×540 mm W×1000 mm H
Net Weight
60 Kg
Payment Terms
L/C, T/T, Western Union
NST 3 HEADS COMPACT RF PLASMA MAGNETRON SPUTTERING COATER is mainly used to make non-conductive films, especially some oxide films.It is the most cost-effective coater for researching in the new generation of oxide thin films.
Technical Specifications
| Input Power | Single phase 220 VAC, 50 / 60 Hz 1000 W (including vacuum pump and water chiller) If the voltage is 110 V, a 1500 W transformer can be ordered at our company |
| Power Source | 13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads Load range: 0 – 80 Ω adjustable. Tuning range: -200j – 200j adjustable The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” (no breaking of vacuum and plasma during a multilayer process) With a DC power supply, the coater can be easily modified into 1” DC sputtering sources for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations |
| Magnetron Sputtering Head | Three 1″ magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps One manually operated shutter is built on the flange One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads |
| Sputtering Target | Target size requirement: 1″ diameter×1/8″ thickness max Sputtering distance range: 50 – 80 mm adjustable Sputtering angle range: 0 – 25° adjustable 1″ diameter Cu target and Al2O3 target are included for demo testing |
| Vacuum Chamber | Vacuum chamber: 256 mm OD×238 mm ID×276 mm Height, made of high purity quartz Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking |
| Sample Holder | Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover Sample holder size: 50 mm Dia. for. 2″ wafer max Rotation speed: 1-10 rpm adjustable for uniform coating The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller |
| Vacuum Pump | KF40 vacuum port is built in for connecting to a vacuum pump. Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump |
Looking for "NST-3 Heads Compact RF Plasma Magnetron Sputtering Coater" ?
Piece
Explore More Products
