Dadri, Gautam Buddha Nagar, Uttar Pradesh
- GST NO. : 09ARCPD4541L1ZS
Twitter| Business Type | Manufacturer, Exporter, Supplier |
| Brand Name | NST |
| Material | Mild Steel |
| Finishing | Polished |
| Click to view more | |
Preferred Buyer From
| Location | Anywhere in India |
Product Details
Driven Type
Electric
Color
Blue
Condition
New
Certification
ISO 9001:2015
Voltage
220V
Specialities
Rust Proof, Long Life, High Performance, Easy To Operate, Ruggedly Constructed,Less Maintenance
Phase
Single Phase
Warranty
1 Year
Country of Origin
India
Net Weight
60 Kg
Input Power
220 VAC, 50 / 60 Hz
Wattage
1000 W (including vacuum pump and water chiller)
Payment Terms
L/C, T/T, Western Union
CUSTOMIZED 5 HEADS NST PLASMA MAGNETRON SPUTTERING COATER is particularly suitable for exploring solid electrolyte materials, combined by 5 different elements in 16 different ratios.This equipment is mainly used to make an oxide film on a single crystal substrate, so there is no need for a high vacuum environment.
Details
| Features | 5 magnetron sputtering guns for 5 different target materials Depending on the power supplies used (RF or DC), both metallic and non-metallic materials can be deposited. Capable of sputtering 5 target materials to produce various compositions via different sputtering times / rates With optional 5 power supplies, 5 target materials can be sputtered at the same time for combinatorial sputtering 16 samples can be deposited in one batch with a mask and a rotating sample holder |
| Input Power | Single phase 220 VAC, 50 / 60 Hz 1000 W (including vacuum pump and water chiller) |
| Power Source | One 13.5 MHz,300 W auto-match RF generator is included and connected to the sputtering heads The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” without breaking of vacuum during a multilayer process. Multiple RF power supplies are optional, which allows user to sputter multi-target at the same time for combinatorial sputtering Laptop with control software is available at extra cost to control each RF gun’s sputtering time and power |
| Magnetron Sputtering Head | Five 1″ magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps One manually operated shutter is built on the flange One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads |
| Sputtering Target | Target size requirement: 1″ diameter×1/8″ thickness max Sputtering distance range: 50 – 80 mm adjustable Sputtering angle range: 0 – 25° adjustable 1″ diameter Cu target and Al2O3 target are included for demo testing |
| Vacuum Chamber |
Vacuum chamber is made of 304 stainless steel with reinforcing rib Inside vacuum chamber size: 470 mm L×445 mm D×522 mm H (~105 Liters, 18.5“×17.5″× 20.5″) Round 380 mm Dia. hinged type door with 150 mm Dia glass window Temperature range: -15 to 150 °C Vacuum level: 4.0E-5 torr with turbo pump |
| Sample Holder |
150 mm diameter rotatable sample holder for coating 16 sample one one batch with different compositions Sample holder and mask rotation can be controlled manually by a button or automatically by a control software (Optional) The sample holder temperature is adjustable from RT to 600 °C max |
| Vacuum Pump | KF40 vacuum port is built in for connecting to a vacuum pump. A compact turbo pump is included 4.0E-5 Torr with optional turbo pump |
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